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Design for Manufacturability and Yield for Nano-Scale CMOS

Cover von Design for Manufacturability and Yield for Nano-Scale CMOS

Integrated Circuits and Systems

Chiang, Charles/Kawa, Jamil

Springer Verlag GmbH

106.99

(inklusive MwSt.)

Verfügbarkeit: Besorgungstitel, Festbezug

Zusatztext

Manufacturability and yield are no longer a fabrication, packaging, and test concerns. They are aspects that have to be designed in, and they are everybodys responsibility. Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, and through statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a designs manufacturability and yield. A must read book for the serious designer.

Weitere Details

Erschienen: 26.07.2007

Umfang: xxvii, 255 S.

Sprache: ENG

Einband: GEB

ISBN/EAN: 9781402051876

Umbreit-Nr.: 1489918

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